X-ray Photoelectron Spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a mature and widely used surface analysis technique for materials characterization. XPS provides quantitative elemental and chemical state information from the upper most 10 nm of material. The technique is used in many diverse applications, ranging from multilayer coatings on architectural glazing to drug eluting thin films in the pharmaceutical industry.
FACTS houses Kratos AXIS Supra XPS that is equipped with an automated dual anode (Al/Ag Kα) X-ray monochromatic source. The combination of high transmission hemispherical and spherical mirror analysers along with the use of delay-line detector enables outstanding spectroscopy and fast parallel imaging. The system also allows ion sputter depth profiling by employing the multi-mode Ar Gas Cluster Ion Source (GCIS) capable of generating Ar+ and Arn+ clusters. The XPS spectroscopy and imaging techniques are complemented by additional surface science accessories such as ultraviolet photoelectron spectroscopy (UPS) and ion scattering spectroscopy (ISS) kits.
1. Teddy Salim (Dr), email: email@example.com
2. Weiling Liu (Dr), email: firstname.lastname@example.org
Kratos AXIS Supra
- Large 500 mm Rowland circle monochromator
- 180° hemispherical analyser (HSA) for spectroscopy mode and spherical mirror analyser (SMA) for parallel-imaging mode
- Multichannel plate array with delay-line detector (DLD) for phoelectron counting
- Integral charge neutralizer for a wide range of insulating samples
- Attachments: ISS, ultraviolet lamp He I/He II discharge for UPS, sample heating and cooling (–100 °C to +800 °C)